Envoy

• HCl - Hydrochloric Acid Mix and Dispense

• HF and BHF Blend and Dispense

• H2SO4 - Sulfuric Acid Mix and Dispense

• H3PO4 - Phosphoric Acid Mix and Dispense 

• H2O2 - Hydrogen Peroxide Mix and Dispense 

• NH4OH - Ammonium Hydroxide Mix and Dispense

• TMAH Precision developer Mix and Dispense

• SC1/SC2 Blend and Dispense 

• Modular full factory chemical management

• Chemical blend/dispense

• Each module will dispense up to three (3) operator   selected mix ratios

• Dispenses to two (2) tools

• Precision mixing @ +/-0.003% (+/- 30 ppm)

• Particle neutral to 0.03µm

• Bulk, drum or A/B carboy supply

• PTFE quick connects for fast and safe changeouts

• Semi S2-93 and CE compliant

• Non-intrusive sensor package

• Pulse free flow through high purity pump Splash guard

• Exhaust failure monitoring 

• Filter venting 

• Full factory management interface.

• Slurry Dilution and Dispense

• Two (2) Part Slurry Blend and Dispense

• Silicon Carbide CMP Mix and Dispense

• Edge Bead Removal Dispense

• Critical Slope Reaction Slurry Blend and Dispense

• Modular full factory chemical management

• Chemical blend/dispense

• Each module will dispense up to three (3) operator   selected mix ratios

• Dispenses to two (2) tools

• Precision mixing @ +/-0.003% (+/- 30 ppm)

• Particle neutral to 0.03µm

• Bulk, drum or A/B carboy supply

• PTFE quick connects for fast and safe changeouts

• Semi S2-93 and CE compliant

• Non-intrusive sensor package

• Pulse free flow through high purity pump Splash guard

• Exhaust failure monitoring

• Filter venting 

• Full factory management interface. 

• Automatic Just-In-Time blend and dispense

• Specifically designed for hard to handle slurries and critical ratio concentration control

• Optional on-board metrology for PH/ORP, Density, Temperature and other critical parameters

• Automatic DI flush and batch sampling port

• Automatic filter venting

• Use-management software: including; time, batch, number of processes run and metrology data logging